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High-Speed, Low-Temperature Deposition of Hard Ceramics Coating

update:2017-03-08
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Features
Metal processing requires high-speed and dry cutting to improve productivity and reduce costs. The surface of cutting tools is generally coated by a hard, wear-resistant materials, such as Ti(C,N) and Al2 O3 . Chemical vapor deposition (CVD) has been widely used for preparing hard coatings; however, recent demand is developing a technique for high-speed and low-temperature deposition in order to enhance the cutting performance. We have introduced lasers into CVD process to enhance chemical reaction and have successfully prepared α-Al2 O3 films at low deposition temperature and high deposition rate. Orientations of α-Al2 O3 films were controlled by changing deposition conditions.

Targeted Application(s)/Industry
We have demonstrated that laser CVD can prepare not only Al2 O3 but also other engineering ceramics, such as Y2 O3 -ZrO2 , Y2 O3 -SiO2 and SiC with significant orientation growth and high deposition rate. Laser CVD can develop a new premium for protective coating on tools and high-temperature structural materials.

Researchers

Institute for Materials Research

GOTO, Takashi , Professor

Collaborative Researchers

Keywords

Related Information

Publication
A. Ito, H. Kadokura, T. Kimura, T. Goto: Texture and orientation characteristics of α-Al2O3 films prepared by laser chemical vapor deposition using Nd:YAG laser, Journal of Alloys and Compounds 489(2) (2010) 469-474.
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