Photo-Functional Advanced Materials for Nanofabrication by Nanoimprint Lithography
update：2020-06-16
Features
Nakagawa group has dedicated to pursue scientific principles for molecular control of interface function occurring at polymer/other material interfaces and to put them into practice in nanoimprint lithography promising as a next generation nanofabrication tool. We are developing advanced photo-functional materials such as sticking molecular layers for "fix by light", UV-curable resins and antisticking molecular layers for "preparation by light", fluorescent resist materials for "inspection by light", and hybrid optical materials "available to light" and new research tools such as mechanical measurement systems to evaluate release property of UV-curable resins.Targeted Application(s)/Industry
Our research aims at creating new devices to control photon, electron, and magnetism.Researchers
Institute of Multidisciplinary Research for Advanced Materials
NAKAGAWA Masaru
, Professor
Doctor of Engineering
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