• We have been developing methods for explicating the dominant factors that determine the physical and chemical properties of materials and stacked structures used in human societies. Since the number of element atoms which consists of advanced materials has been increasing, and the crystallographic structure of the materials has become very complicated, both the various properties and reliability of the materials fluctuate significantly in nano-scale, and thus, deteriorate easily due to the local damages of the materials.

To design the optimal structure, composition of materials, and the fabrication process of both materials and stacked structures, we are going to develop a method of analyzing the atomic structure of thin film materials based on quantum mechanics and experimental methods for measuring material properties, atomic scale damage or defects in nano-materials.

• The cold spray (CS) technique is known as a new technique not only for coating but also for thick depositions. It has many advantages, i.e. dense coating, high deposition rate, low oxidation, and no phase transformation. We have been carrying out establishment of innovative preparing and coating techniques using the CS, and maintenance of reliability and safety of the cold sprayed repairing parts and coatings. Moreover, in order to evaluate the compatibility between a substrate material and particles based on an adhesion mechanism and scientific basis, various adhesion conditions are examined a micro / nano-structure observation and a molecular simulation.

Our targets were mainly hot section parts of thermal power plants and reactor piping and tubes etc. Recently, it is possible to make a ceramic coating. Therefore, we accelerate the evolution of the other fields including the creation of the functionality materials in near future.

• The cold spray (CS) technique is known as a new technique not only for coating but also for thick depositions. It has many advantages, i.e. dense coating, high deposition rate, low oxidation, and no phase transformation. We have been carrying out establishment of innovative preparing and coating techniques using the CS, and maintenance of reliability and safety of the cold sprayed repairing parts and coatings. Moreover, in order to evaluate the compatibility between a substrate material and particles based on an adhesion mechanism and scientific basis, various adhesion conditions are examined a micro / nano-structure observation and a molecular simulation.

Our targets were mainly hot section parts of thermal power plants and reactor piping and tubes etc. Recently, it is possible to make a ceramic coating. Therefore, we accelerate the evolution of the other fields including the creation of the functionality materials in near future.

• One of our major research focuses is to design the novel drug nanoparticles, so called “Nano-prodrugs”, and to apply them as anticancer drugs or eye drops with excellent delivery efficiency. Nano-prodrugs are constructed by synthetic prodrugs molecules which contains poorly water-soluble substituent. They could be fabricated to nanoparticles with 100 nm or less in size by our reprecipitation technique, which has been used to create organic nanomaterials. We are aiming at practical application of our Nano-prodrugs in the near future.

Our reprecipitation technique for fabricating organic nanomaterials is a versatile technique that can be applied to various organic molecules as well as drug compounds. We hope to conduct collaborative research with a willing company on controlling and evaluating properties of the organic nanoparticles.

Light curing high strength resin mold
https://www.t-technoarch.co.jp/data/anken_en/T11-053.pdf

Light curing high strength resin mold
https://www.t-technoarch.co.jp/data/anken_en/T11-053.pdf

We offer shared facility for the development of semiconductor prototypes equipped with 4-inch, 6-inch and some 8-inch wafer fabrication tools available on an hourly basis. Know-how accumulated at Tohoku University is available, and staff provide maximum support for prototyping. The service is performed at the 1,200 m2 Super Clean Room on the second floor of the Junichi Nishizawa Memorial Research Centre at Tohoku University. For information on equipment and fees, see our website.

More than 10 experienced technical staff assist customer's usages. Standard process conditions for each process, such as etching and deposition, are provided. allowing customers to start prototyping immediately. Various materials other than silicon can also be supported.

• We support the development of devices and semiconductor materials such as MEMS, optical elements and RF components.
• Technical consultation on devices and processes before and during prototyping is also available.
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• 'Prototype lab' for device packaging is also available.
• The museums where you can learn about the history of semiconductors, measuring instruments and sensors are open.
• As part of Technology Co-creation for Semiconductor of Tohoku University, we promote R&D of semiconductors and the development of human resources.
• On-demand semiconductor human resource development programs for students and engineers are available.
• As a member of the MEXT's Advanced Research Infrastructure for Materials (ARIM) program, we are involved in sharing facility and data.

More than 310 companies have used our shared facility since its launch in 2010, not only from device manufacturers such as MEMS, but also from manufacturers of materials, mechanical components and equipment. To date, we have successfully supported the commercialization of about 10 devices.