We offer shared facility for the development of semiconductor prototypes equipped with 4-inch, 6-inch and some 8-inch wafer fabrication tools available on an hourly basis. Know-how accumulated at Tohoku University is available, and staff provide maximum support for prototyping. The service is performed at the 1,200 m2 Super Clean Room on the second floor of the Junichi Nishizawa Memorial Research Centre at Tohoku University. For information on equipment and fees, see our website.

More than 10 experienced technical staff assist customer's usages. Standard process conditions for each process, such as etching and deposition, are provided. allowing customers to start prototyping immediately. Various materials other than silicon can also be supported.

• We support the development of devices and semiconductor materials such as MEMS, optical elements and RF components.
• Technical consultation on devices and processes before and during prototyping is also available.
• A
• 'Prototype lab' for device packaging is also available.
• The museums where you can learn about the history of semiconductors, measuring instruments and sensors are open.
• As part of Technology Co-creation for Semiconductor of Tohoku University, we promote R&D of semiconductors and the development of human resources.
• On-demand semiconductor human resource development programs for students and engineers are available.
• As a member of the MEXT's Advanced Research Infrastructure for Materials (ARIM) program, we are involved in sharing facility and data.

More than 330 companies have used our shared facility since its launch in 2010, not only from device manufacturers such as MEMS, but also from manufacturers of materials, mechanical components and equipment. To date, we have successfully supported the commercialization of about 10 devices.

• To realize IoT society, it is required the sensors, which function without battery charge. We study on energy harvesting materials using our knowledge about materials mechanics and numerical simulation such as finite element method. We recently address to develop energy harvesting devices, which can recovery the unharnessed　energy around us as electrical energy.

• Our research target is mainly focused on the topic of development of novel scintillator crystals, piezoelectric crystals, growth technology, characterization and its device application.
• We design and synthesize new materials from a view point of Crystal Chemistry, and investigate their structure and physical properties. We also study on photo-detector, as suitable photo-detector fully contribute to get maximum signal from scintillator. This activity is very important to realize practical application of our developed materials. Recently, piezoelectric material and high melting temperature alloy project is also started.

For the purpose of "real" contribution to human culture, we are always carrying out our research activity considering the industrial application. This point is unique feature of our attitude toward science.

• We are studying MEMS (Micro Electro Mechanical Systems) and related technologies, which are typically used for the input/output of information/communication devices, the safety of automobiles etc. Our representative topics include integrated sensors, piezoelectric devices, RF MEMS, micro energy devices and wafer-level packages. Our facilities are open-accessible and well equipped with a lot of tools for lithography, dry/wet etching, thin film deposition, wafer bonding, device mounting and evaluations, which can be operated by each researcher. Using these tools, a variety of MEMS are being prototyped. Also, new microfabrication tools are being developed by ourselves.

We are collaborating with many companies, from which visiting researchers are dispatched to our laboratory. We also accept companies which want to just use specific tools in our facilities. Consultation is always welcome.

We offer shared facility for the development of semiconductor prototypes equipped with 4-inch, 6-inch and some 8-inch wafer fabrication tools available on an hourly basis. Know-how accumulated at Tohoku University is available, and staff provide maximum support for prototyping. The service is performed at the 1,200 m2 Super Clean Room on the second floor of the Junichi Nishizawa Memorial Research Centre at Tohoku University. For information on equipment and fees, see our website.

More than 10 experienced technical staff assist customer's usages. Standard process conditions for each process, such as etching and deposition, are provided. allowing customers to start prototyping immediately. Various materials other than silicon can also be supported.

• We support the development of devices and semiconductor materials such as MEMS, optical elements and RF components.
• Technical consultation on devices and processes before and during prototyping is also available.
• A
• 'Prototype lab' for device packaging is also available.
• The museums where you can learn about the history of semiconductors, measuring instruments and sensors are open.
• As part of Technology Co-creation for Semiconductor of Tohoku University, we promote R&D of semiconductors and the development of human resources.
• On-demand semiconductor human resource development programs for students and engineers are available.
• As a member of the MEXT's Advanced Research Infrastructure for Materials (ARIM) program, we are involved in sharing facility and data.

More than 330 companies have used our shared facility since its launch in 2010, not only from device manufacturers such as MEMS, but also from manufacturers of materials, mechanical components and equipment. To date, we have successfully supported the commercialization of about 10 devices.

• Our research target is mainly focused on the topic of development of novel scintillator crystals, piezoelectric crystals, growth technology, characterization and its device application.
• We design and synthesize new materials from a view point of Crystal Chemistry, and investigate their structure and physical properties. We also study on photo-detector, as suitable photo-detector fully contribute to get maximum signal from scintillator. This activity is very important to realize practical application of our developed materials. Recently, piezoelectric material and high melting temperature alloy project is also started.

For the purpose of "real" contribution to human culture, we are always carrying out our research activity considering the industrial application. This point is unique feature of our attitude toward science.

Colorful TiO2 Particle
https://www.t-technoarch.co.jp/data/anken_en/T19-849.pdf

Transition metal compounds are known to exhibit a wide variety of colors. Until now, it has been possible to color white titanium oxide by doping with transition metal ions, but it is difficult to avoid biotoxicity derived from transition metals.

• In the present invention, titanium oxide inorganic pigments that do not contain transition metals and have various colors such as white, yellow, red, gray, green, purple, black, and skin color have been realized.

New applications of titanium oxide pigments are expected in the cosmetics field, where biotoxicity is an issue.

• Since we have developed the techniques (ion control plasma) to generate and control ions, electrons, reactive species (radicals) in the low temperature non-equilibrium plasmas which I can touch by hand, the composite materials using nanoparticles, nanocarbons, biological molecules are synthesized in the nano-electronics field, the minimally-invasive and highly-efficient drug/gene transfection systems are developed in the medical field, and bacteria and insects are killed by the plasma in place of pesticide in the agricultural field.

The ion-controlled plasmas are applied for the minimally-invasive gene transfection system, next-generation agricultural system, the electrode material of highly-efficient battery, and so on. We hope to conduct the collaborative research with a willing company for a practical application of the novel plasma nano-medical-agricultural applied technology in industry.

• Plasma sterilization has been developed as an alternative sterilization method due to its chemical activity, operation at low temperature and atmospheric pressure, low power consumption, low cost and safety. We have studied a mechanism of chemical species generation and transport in a plasma flow and, the sterilization efficacy and mechanism for several plasma sources at atmospheric pressure, such as a microwave plasma flow, a dielectric barrier discharge in a tube and a water vapor plasma flow. We already clarified that the damages of outer membrane and destructions of the cytoplasmic membrane of Escherichia coli by exposure to the microwave plasma flow. Fig. 1 shows the effect of plasma exposure on the E. coli. When the E. coli was exposed to the plasma, the height of the E. coli decreased and the potassium leakage of cytoplasmic material increased. For sterilization in a tube, we also clarified that an induced flow in the narrow tube by DBD transports chemical species and sterilize the whole inside surface of a tube as shown in Fig. 2. We hope to conduct collaborative research with a willing company for a practical application of this technology in industry.